Characterization and failure analysis of a sensor using impedance frequency response spectra

ABSTRACT

According to at least one aspect of the present disclosure, a method includes applying an alternating current having a frequency at a selected voltage to a sensor, wherein the voltage is applied between a reference electrode and a working electrode of the sensor, varying the frequency of the alternating current between a lower frequency and an upper frequency, measuring an impedance of the sensor between the reference electrode and the working electrode as a function of the frequency of the alternating current, analyzing the measured impedance to determine a total impedance of the sensor and the real and imaginary components of the total impedance at each applied frequency of the alternating current, and characterizing the sensor based on the total impedance at the low frequency end of the sensor and on the real and imaginary components of the total impedances.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present continuation-in-part application is related to and claimsthe priority benefit of U.S. patent application Ser. No. 16/229,949,filed on Dec. 21, 2018 and Ser. No. 15/283,022, filed on Sep. 30, 2016,the entire contents of which are incorporated herein by reference.

TECHNICAL FIELD

The present disclosure generally relates to characterizing measuringsensors, particularly characterizing electrochemical measuring sensors.

BACKGROUND

Measuring sensors, particularly electrochemical measuring sensors, arewidely used for quality monitoring, process control and research inagriculture, beverages, foods, water, various industries and researchlabs. Such measuring sensors include pH sensors. A critical component ofa pH sensor is a pH glass membrane. Generally, pH glass material used inthe pH glass membrane is specially formulated to make the materialsensitive to hydrogen ions (H⁺).

Conventionally, to test and verify the proper functioning of a pHsensor, the sensor is placed in contact with a standard buffer solutionof known pH (e.g., pH 4, 7 and 10 buffers), and the sensor's signaloutput is displayed and verified using a pH meter. Certain pH metersinclude a function to measure glass impedance. However, such meters arenot accurate enough or capable to distinguish sensor failure modes, suchas a crack in the glass membrane or a short circuit in the sensor.

If in case a sensor failed to work normally, for whatever reason (e.g.,harsh application conditions, inappropriate selection of sensor type,manufacturing processes, changes of material/part supply etc.), physicalexamination and often destruction (e.g., dissection) of the sensor haspreviously been the only way to determine the failure mode and rootcause of failure of the sensor. However, dissecting a pH sensor can bevery time consuming. In addition, it is not guaranteed to see root causeafter dissection. For example, a micro-crack at the pH glassmembrane/glass stem interface in transversal direction may not bevisible. More often, dissection can easily damage the signs of rootcause because of the complex construction of a pH sensor, which isusually built with materials of wide range mechanical and physicalproperties from liquid and soft rubber, to hard plastic, rigid epoxy,and very hard but brittle glass.

Accordingly, there remains a need for further contributions in this areaof technology to enable a method to characterize failure modes and todetermine the root cause of such failures a measuring sensor.

BRIEF SUMMARY

According to at least one aspect of the present disclosure, a method forcharacterization and failure analysis of a measuring sensor isdisclosed. The method includes applying an alternating current having afrequency at a selected voltage to a sensor, where the voltage isapplied between a reference electrode and a working electrode of thesensor. The frequency of the alternating current is varied between alower frequency and an upper frequency over a range from a higherfrequency end to a lower frequency end. The method includes measuring animpedance of the sensor between the reference electrode and the workingelectrode over the range of frequencies of the alternating current. Themeasured impedance is analyzed to determine one or more total impedanceof the sensor and the real and imaginary components of the one or moretotal impedance at and over the applied frequencies of the alternatingcurrent. The sensor is characterized based on the one or more totalimpedance and on the real and imaginary components of the one or moretotal impedance. The method can further include generating a measuredimpedance frequency response spectrum.

In an embodiment, the characterizing includes identifying whether thetotal impedance at low frequency end is below a lower threshold or abovean upper threshold and/or whether imaginary components at variousfrequencies are predominantly greater than or less than zero.

In an embodiment, the method characterizes a sensor in which the totalimpedance at low frequency end is below the lower threshold and theimaginary components at various frequencies are predominantly greaterthan zero as having a defect in a membrane of the sensor. The method maycharacterize a sensor in which the total impedance at low frequency endis below the lower threshold and the imaginary components at variousfrequencies are predominantly less than zero as having a short circuit.

In an embodiment, the lower threshold is around 5 megaohms (MΩ), and theupper impedance threshold is about 50 MΩ. In an alternate embodiment,the lower threshold is around 10 MΩ, and the upper threshold is about 5gigaohms (GΩ). In a further embodiment including a pH sensor, the lowerthreshold is less than about 0.1 MΩ or less than about 10 kiloohms (kΩ).In a further embodiment including an oxidation-reduction potentialsensor, the lower threshold is less than about 100Ω or less than about10Ω.

The method may characterize a sensor in which the total impedance at lowfrequency end is above the upper threshold and the real/imaginarycomponent ratio at various frequencies is predominantly less than athreshold is characterized as having an open circuit. In an embodiment,the upper threshold is about 5 GΩ and the ratio threshold is around 0.1.In a further embodiment, the upper threshold is greater than about 10GΩ.

In an alternate embodiment, the method further includes data fitting themeasured impedance to generate a simulated response spectrum andapplying an equivalent circuit model to the simulated response spectrumto estimate the capacitance, resistance and Warburg coefficient of thesensor. The characterization of the sensor may include predicting aperformance of the sensor using the estimated capacitance, resistanceand Warburg coefficient. The analyzing may include generating a plot ofthe measured impedance as a function of the frequency of the alternatingcurrent to yield a frequency response spectrum. The plot may be aNyquist plot.

In an embodiment the frequency of the alternating current is varied overa spectrum. Or alternately the frequency of the alternating current isvaried between discrete predetermined frequencies.

In an embodiment, the sensor is a pH sensor. The reference electrode maybe an external reference electrode connected to or associated with thesensor

The sensor may be characterized as a step in a quality control process.The characterization may include determining a failure mode of thesensor. The characterization may include checking a status of thesensor.

In an embodiment, the sensor includes equipment suitable to perform themeasuring of the impedance of the sensor. The equipment may beintegrated into a plug head of the sensor.

In further embodiments, the method may be implemented using a pH sensor,an oxidation-reduction potential sensor or a combination pH andoxidation-reduction potential sensor. In such embodiments, the methodmay characterize a sensor in which the total impedance is above theupper threshold and the real/imaginary component ratio at variousfrequencies is predominantly less than a threshold is characterized ashaving an open circuit. In a further embodiment, the upper threshold isgreater than about 10 GΩ.

BRIEF DESCRIPTION OF THE DRAWINGS

The described embodiments and other features, advantages and disclosurescontained herein, and the manner of attaining them, will become apparentand the present disclosure will be better understood by reference to thefollowing description of various embodiments of the present disclosuretaken in junction with the accompanying drawings, wherein:

FIG. 1 shows a cross-sectional view of a sensor, according to anembodiment of the present disclosure;

FIG. 2 illustrates an embodiment of a method of characterizing a sensor,according to an embodiment of the present disclosure;

FIG. 3 shows a Nyquist plot of an impedance frequency response spectrumof a properly functioning sensor, according to an embodiment of thepresent disclosure;

FIGS. 4A and 4B show equivalent circuits, according to exemplaryembodiments of the present disclosure;

FIG. 5 shows a Nyquist plot of an impedance frequency response spectrumof a properly functioning sensor, according to an embodiment of thepresent disclosure;

FIGS. 6A-6C show Nyquist plots of impedance frequency response spectraof exemplary defective sensors, according to an embodiment of thepresent disclosure;

FIG. 7 shows Nyquist plots of impedance frequency response spectra of adefect sensor before and after a repair procedure, according to anembodiment of the present disclosure;

FIG. 8 shows Nyquist plots of impedance frequency response spectra ofthree test sensors, according to an embodiment of the presentdisclosure;

FIGS. 9A and 9B show Nyquist plots of impedance frequency responsespectra of a test sensor before and after conditioning and surfacetreatment, according to an embodiment of the present disclosure;

FIGS. 10A-10C show pH measurements in millivolts (mV) against time inseconds (s) for test sensors before and after conditioning, according toan embodiment of the present disclosure;

FIGS. 11A-11F show Nyquist plots of impedance frequency response spectraof three test sensors before and after conditioning, according to anembodiment of the present disclosure;

FIG. 12 shows an oxidation-reduction potential sensor;

FIG. 13 illustrates an embodiment of a method of characterizing asensor, according to an embodiment of the present disclosure;

FIG. 14 illustrates a test signal according to the present disclosure;and

FIG. 15 shows a combination pH and oxidation-reduction potential sensoraccording to the present disclosure.

DETAILED DESCRIPTION

The present application discloses various embodiments of methods forcharacterization and failure analysis of a measuring sensor. Accordingto one aspect of the present disclosure, methods of applying measuredimpedance frequency response spectra to sensor characterization aredisclosed. According to a further aspect of the present disclosure,methods of applying measured impedance frequency response spectra tosensor failure mode analysis are disclosed, specifically with respect topH sensors. In certain aspects, the disclosed methods may generallyapply a form of electrochemical impedance spectroscopy (EIS). For thepurposes of promoting an understanding of the principles of the presentdisclosure, reference will now be made to the embodiments illustrated inthe drawings, and specific language will be used to describe the same.It will nevertheless be understood that no limitation of the scope ofthis disclosure is thereby intended. In particular, the disclosedmethods may be applied to measuring sensors other than pH sensors,specifically to electrochemical measuring sensors.

FIG. 1 illustrates a sensor 10 placed in a reservoir 50 containing atest solution 52. The sensor 10 may be an electrochemical measuringsensor including a reference cell containing an internal electrolyte. Incertain embodiments, the sensor 10 is a pH sensor. The sensor 10 mayinclude a sensor body 12 within which a tube 14 is disposed. The tube 14may be a glass tube. As shown in FIG. 1 , the tube 14 may include amembrane 16 affixed to a distal end of the tube 14 and a front seal 40,thereby defining a volume containing a first electrolyte 30. Themembrane 16 may be a glass membrane made of doped glass formulated to besensitive to a specific ion. In embodiments in which the sensor 10 is apH sensor, the membrane 16 is sensitive to hydrogen ions (i.e., H⁺). Aworking electrode 20 may be disposed within the first electrolyte 30such that the working electrode 20 is in electrochemical communicationwith the test solution 52 through the membrane 16. In embodiments wherethe sensor 10 is a pH sensor, the working electrode 20 may be referredto as a pH electrode. In certain embodiments, the working electrode 20may be a silver chloride electrode (i.e., a Ag/AgCl electrode);nonetheless, other types of electrodes are applicable.

The sensor 10 may further include a reference electrode 22 positionedwithin a volume defined by the sensor body 12, a back seal 44, whichseals the proximal ends of both the sensor body 12 and the tube 14, anda middle junction 36, which seals the gap between the sensor boy 12 andthe tube 14, such that the defined volume contains a second electrolyte32. In certain embodiments, the reference electrode 22 may be a silverchloride electrode (i.e., a Ag/AgCl electrode). In certain embodiments,the sensor 10 may include a front junction 38 disposed at the distal endof the sensor body 12 such that the front junction 38 seals the gapbetween the sensor body 12 and the tube 14 and therewith defines avolume containing a third electrolyte 34. In certain embodiments, asshown in FIG. 1 , the sensor 10 may include a temperature sensor 24disposed adjacent the working electrode 20 and in the first electrolyte30 to indicate the temperature of the first electrolyte 30. The workingelectrode 20, reference electrode 22 and the temperature sensor 24 mayinclude lead lines 28 that pass through the back seal 44, are bundledtogether in a cable 26, and enable electrical communication betweenthese components of the sensor 10 and external sources and meters (notshown). While FIG. 1 illustrates a double junction pH sensor, thedisclosed methods may be applied to single junction pH sensors as wellas other types of electrochemical measuring sensors.

In at least one embodiment of the present disclosure, the sensor 10 maybe an oxidation-reduction potential (“ORP”) electrochemical sensoroperating on the principle of oxidation-reduction potential, whichmeasures a system's capacity to either release or accept electrons fromchemical reactions to act as an oxidizing or reducing agent. In anembodiment according to FIG. 12 , an ORP sensor 200 may include an ORPelectrode 220 (e.g., a working electrode) having a contact wire 221contacting an electrode 224. The ORP sensor 200 is configured such thatthe ORP electrode 220 may be placed in contact with the test solution52. In at least one embodiment, the ORP electrode 220 may include aconventional ORP electrode known to those in the art. For example, in anembodiment, the ORP electrode 220 may include a metal in contact wire221 and electrode 224 with a solution of the same metal ions, e.g., asilver contact in a solution of silver nitrate, which will develop apotential proportional to the silver ion activity. In alternativeembodiments, the ORP electrode 220 may include a metal contact wire 221coated with a sparingly soluble salt of the same metal in contact with asolution containing the anion of that metal's salt, e.g., asilver-silver chloride contact wire in a potassium chloride solution. Inat least one embodiment, the ORP electrode 220 may include a noble metalelectrode 224 in contact with a solution containing both oxidized andreduced forms of an oxidation-reduction system. In such an embodiment,the noble metal electrode 224 may be a platinum, gold, rhodium oriridium material.

The ORP sensor 200 may further include a reference electrode 222configured such that the reference electrode 222 may be placed incontact with the test solution 52. In at least one embodiment, thereference electrode 222 may include be a reference electrode known tothose in the art. For example, in certain embodiments, the referenceelectrode 222 may be a silver chloride electrode (i.e., a Ag/AgClelectrode) and constructed similarly to the reference electrode 22 ofFIG. 1 . In certain embodiments, the reference electrode 222 may includea standard hydrogen electrode (SHE) known in the art. In at least oneembodiment, the reference electrode 222 may include a pH electrode. Inat least one embodiment, ORP sensor 200 and reference electrode 222 arecombined in one common housing such as, for example, the workingelectrode 20 and the reference electrode 22 of the sensor 10 arecombined in the sensor body 12.

The sensor 200 may include a measuring circuit 226 configured to measurea voltage generated across a circuit formed by the ORP electrode 220(e.g., the positive pole of the circuit) and the reference electrode 222(e.g., the negative pole) with the test solution 52 in between. Incertain embodiments, the ORP electrode 220 and the reference electrode222 may be in electrical contact with external sources and measuringmeters.

Referring to FIG. 1 , where the sensor 10 is a pH sensor, when sensor 10is placed in contact with the test solution 52, the charge distributionsat the interfaces of the membrane 16 to test solution 52 and of themembrane 16 to first electrolyte 30 are strongly affected by the H+ ionsin the test solution 52. At equilibrium, the potential at membrane/testsolution interface, E_(g/s), is a function of H⁺ activity, a_(H) ₊ :

$\begin{matrix}{E_{g/s} \sim {2.3026\frac{RT}{F}{\log\left( a_{H^{+}} \right)}}} & \left\lbrack {{EQN}.\mspace{11mu} 1} \right\rbrack\end{matrix}$where R is the molar gas constant 8.3144 J mol⁻¹ K⁻¹, T is thetemperature in Kelvin, F is the Faraday constant 96,485.3 C·mol⁻¹, and2.3026 is a conversion between natural and common logarithm. Since thepH of the first electrolyte 30 within the membrane 16, the potential ofworking electrode 20, and the potential of the reference electrode 22are all constants, the overall potential difference between pH and Refelectrodes is:

$\begin{matrix}{{\Delta E_{{pH}\text{-}Ref}} = {E^{\prime} + {2.3026\frac{RT}{F}{\log\left( a_{H^{+}} \right)}}}} & \left\lbrack {{EQN}.\mspace{11mu} 2} \right\rbrack\end{matrix}$where E′ is constant. Since pH is defined as pH=−log (a_(H) ₊ ), atgiven temperature, there is linear relationship between ΔE_(pH-Ref) andpH:ΔE _(pH-Ref) =E′−1.98×10⁻⁴ T·pH  [EQN. 3]

For example, ΔE_(pH-Ref) is 177.5 mV at pH 4, 0 mV at pH 7, and −177.5mV at pH 10 at 25° C.; with slope −59.1667. A properly functioningsensor 10 should follow EQN. 3, such that its voltage readingΔE_(pH-Ref) in pH buffer 7 should be 0 mV and the slope should be about−59.17 at 25° C. Usually a small error (e.g., ±12 mV) is acceptable anddefined in the specification of the sensor 10.

Given the complexity of the assembly, the sensor 10 may be manufacturedwith defects that harm the performance of the sensor 10 in operation.For example, poor manufacturing processes, planned and unplanned changesof material or part supply, bad in-coming material or handling, etc.Alternatively, defects may develop during operation due to variousfactors, such as harsh application conditions, inappropriate selectionof sensor, end of life span, wear, etc. One aspect of the presentdisclosure includes a method to characterize and analyze a sensor tofacilitate root cause failure analysis of the sensor without furtherdamaging the sensor under test. In at least one embodiment of thepresent disclosure, a method of applying measured impedance frequencyresponse spectra to characterize and analyze electrochemical measuringsensors is disclosed. The method will be disclosed with respect to thecharacterization and analysis of a pH sensor. Nonetheless, the methodmay be applied other types of electrochemical sensors, such aselectrochemical measuring sensors.

In at least one embodiment of the present disclosure as shown in FIG. 2, a method 100 of characterization and failure analysis of the sensor 10includes a step 102 of applying an alternating current (AC) at aselected voltage to the sensor 10 between the reference electrode 22 andthe working electrode 20. For example, the selected voltage may berelatively small to prevent damaging the sensor 10 but large enough togenerate a response from the sensor 10. In at least one embodiment, theselected voltage is around 100 millivolts (mV). The method 100 includesa step 104 of varying the frequency of the AC between a lower frequencyand an upper frequency over a range having a low frequency end and anupper frequency end.

In the step 104, the frequency of the applied AC may be varied over awide range having a low frequency end and an upper frequency end. Asused herein, “end” may include a discrete frequency in the range;additionally and alternatively, “end” may include a number offrequencies toward an end region of the range. For example, the rangemay extend from 1 megahertz (MHz) to 0.01 Hz. In certain embodiments,the frequency of the applied AC may be varied through a scan over anarrower range, such as 300 kHz to 0.01 Hz. In further embodiments, thefrequency of the applied AC may be varied in discrete steps betweendiscrete predetermined frequencies from one desired frequency to thenext. In such an embodiment, for example, discrete frequencies of 300kHz, 100 kHz, 50 kHz, 10 kHz, 1 kHz, 1 Hz and 0.01 Hz may be applied tothe sensor 10. Accordingly, the varying of the frequency of the AC mayinclude scanning through the desired range of frequencies and selectingdiscrete frequencies in the range. The AC may be applied by any suitablecontrolled power source. In at least one embodiment, apotentiostat/galvanostat may be employed to apply the desiredfrequencies and the selected voltage.

The method 100 further includes a step 106 of measuring an impedance ofthe sensor 10 between the reference electrode 22 and the workingelectrode 20 over the range of frequencies of the alternating current.The step 106 may include measuring the impedance frequency response ofthe sensor 10 or the electrochemical impedance spectrum (EIS) of thesensor 10. The impedance may be measured by any suitable instrument, forexample, a potentiostat/galvanostat. In at least one embodiment of thepresent disclosure, equipment suitable to perform the measuring of theimpedance of the sensor may be included in the sensor. Further, thesensor may include equipment suitable to perform all or part of themethod 100. For example, the sensor may include hardware, software andfirmware suitable to perform all or part of the method 100. In such anembodiment, the equipment may be integrated into a plug head of thesensor. In certain embodiments, the equipment may at least partialinclude the functionality of a potentiostat/galvanostat.

The method 100 may include a step 108 of analyzing the measuredimpedance to determine one or more total impedance of the sensor 10 andthe real and imaginary components of the one or more total impedance atand over the applied frequencies of the AC. In the step 108, theanalysis may include generating a measured impedance frequency responsespectrum. The analysis may further include plotting the real part of thetotal impedance against the imaginary part of the total impedance forthe various frequencies to generate a Nyquist plot. The analysis mayfurther include determining a real/imaginary component ratio at variousfrequencies based the real and imaginary components of the totalimpedance at a given frequency.

The method 100 may further include a step 110 of characterizing thesensor 10 based on the one or more total impedance of the sensor 10 andon the real and imaginary components of the total impedance. In the step110, the characterization may be qualitative and/or quantitative asdiscussed further herein. In certain embodiments, the step 110 includesidentifying the failure mode of an improperly operating sensor based onthe total impedance of the sensor 10 and on the real and imaginarycomponents of the total impedance. The step 110 may further includedetermining the root cause of such failure modes. In an alternativeapplication, the method 100 may be used as a quality control measure toqualify newly manufactured sensors before they are employed in thefield. In a further embodiment, the characterizing of the sensorincludes checking a status of the sensor.

The method 100 has been applied to both functioning and malfunctioningpH sensors in a series of experiments that demonstrate the effectivenessof the method 100. The experiments were conducted on pH sensorsmanufactured by the Applicant and on pH sensors manufactured by othermanufacturers, as noted, using a PMC CHS08A Potentiostat/Galvanostat and3M KCl solution in a Gamry VistaShield Faraday cage. An AC signal of 100mV was applied between the working and reference electrodes with afrequency scan from 300 kHz to 0.01 Hz, unless noted otherwise. Incertain cases as discussed, the AC signal was applied between the sensorreference electrode and an external reference electrode. pH testing wasconducted using Applicant's CM42 pH meter and 200 mL each of pH buffersolutions of 4, 7 and 10 pH.

FIG. 3 shows the measured impedance frequency response spectrum of aproperly functioning Test Sensor 1. In FIG. 3 , the impedance responsehas been presented in a Nyquist plot with the real part of the totalimpedance plotted on the x-axis and the imaginary part of the totalimpedance plotted on the y-axis. Qualitatively, the Nyquist plotexhibits a semicircular portion with a tail at the low frequency end ofthe response spectrum. Quantitatively, both the real and imaginary partsof the total impedance are positive (i.e., greater than zero) and are inthe expected range for the Test Sensor 1. Further, the total impedanceat the low frequency end, around 1000 MS), is also in the expected rangefor the test sensor.

The electrical behavior of a pH sensor, such as the sensor 10 as shownin FIG. 1 , can be characterized with an equivalent circuit, as shown inFIG. 4A. In FIG. 4A, E₁ and E₂ are the potentials of the referenceelectrode 22 and the working (i.e., pH) electrode 20, respectively,which are constants and depend on the electrode materials and the firstelectrolyte 30 and second electrolyte 32 that surround their respectiveelectrodes (i.e., the working electrode 20 and the reference electrode22). R_(j) is the total resistance of front and middle junctions 38, 36,the first, second and third electrolytes 30, 32, 34, and the leads 28.C₁ and C₂ are the double layer capacitances of the reference electrode22 and the working electrode 20, respectively. R₁ and R₂ are theelectrode/electrolyte resistances of the reference electrode 22 and theworking electrode 20, respectively. C_(g) and R_(g) are the capacitanceand charge transfer resistance across the membrane 16. E_(go) and E_(gi)are the potentials of the outside and inside surfaces of the membrane16. W is the Warburg coefficient or diffusion element, which includesthe diffusion resistance of the membrane 16 and has units of Ω·s^(−1/2).The Warburg coefficient may also be represented by “σ”.

The impedance of the Warburg diffusion element can be expressed as:Z _(w)=σ/ω^(1/2) −jσ/ω ^(1/2)  [EQN. 4]where ω=2πf, f is frequency, σ is Warburg coefficient (ohm·s^(−1/2)).The Warburg coefficient can be calculated from the admittance, Y_(o),which may be obtained from data fitting by simulation software:

$\begin{matrix}{\sigma = \frac{\sqrt{2}}{2Y_{o}}} & \left\lbrack {{EQN}.\mspace{11mu} 5} \right\rbrack\end{matrix}$

Among the components in FIG. 1 , the impedance of membrane 16 (i.e.,C_(g)/(R_(g)W)) of a conventional pH sensor is typically in a range ofhundreds of megaohms and can be as high as a few gigaohms. Incomparison, the impedances of the other components are very small.Hence, the equivalent circuit can be simplified as shown in FIG. 4B.Referring to FIG. 3 , the circular data points plot the measuredimpedance data. The square data points are fitting points obtained usingdata fitting/simulation software, ZSimpWin, to fit the equivalentcircuit model of FIG. 4B to the measured impedance. For the datapresented in FIG. 3 , the data fit calculated an equivalentC_(g)=7.2×10⁻⁴ μF, R_(g)=946 MΩ and W=5.89×10⁷Ω·s^(−1/2). These valuesare in line with expected capacitance, resistance and diffusionresistance of a properly functioning pH sensor.

A Nyquist plot of certain sensors may exhibit a semicircular portionthat appears to be slightly compressed in vertical axis, yet with thecharacteristic tail at the low frequency end of the response spectrum.Such a slightly compressed appearance indicates that the simulationcomponent, C_(g), is not an ideal capacitor. With such a sensor, theequivalent circuit of FIG. 4B should include a constant phase element(CPE) instead of C_(g) for generate a more accurate data fit. Thecorresponding capacitance value then can be calculated from thefollowing equations:

$\begin{matrix}{\frac{1}{Z} = {Y = {Q_{o}(j)}^{n}}} & \left\lbrack {{EQN}.\mspace{11mu} 6} \right\rbrack \\{C = {Q_{o}\left( \omega_{\max} \right)}^{n - 1}} & \left\lbrack {{EQN}.\mspace{11mu} 7} \right\rbrack\end{matrix}$where Z is CPE impedance, Y is Admittance, Q_(o) and n can be obtainedfrom data fitting by simulation software, 0<n<1; for pure capacitor,n=1. Accordingly, the simulation software can vary the n parameter tobest fit the data and calculate the corresponding capacitance value.

FIG. 5 shows the measured impedance frequency response spectrum of aproperly functioning Test Sensor 2, which is slightly different thanthat of Test Sensor 1 and, can be best fit with CPE instead of C_(g). InFIG. 5 , the square data points are fitting points obtained using thesimulation software to fit the equivalent circuit using CPE, to themeasured impedance. The data fit calculated an equivalentC_(g)=2.07×10⁻⁴ μF (where Q_(o)=2.5×10⁻¹⁰ S·s^(n) and n=0.93), R_(g)=265MΩ and W=1.91×10⁷Ω·s^(−1/2). These values are in line with expectedcapacitance, resistance and diffusion resistance of a properlyfunctioning pH sensor. Thus, FIGS. 3 and 5 demonstrate how the method100 can be used to characterize the performance of sensors.

Referring to FIG. 1 , the components that can directly affect sensorperformance include the membrane 16, working and reference electrodes20, 22, the middle and front junctions 36, 38, the first, second andthird electrolytes 30, 32, 34, and the front, middle and back seal 40,42, 44 contacting the electrolytes. Any defect with the materials,solutions or structural integrity of these components may cause asensor, namely a pH sensor, malfunction. Some of the commonlyencountered failure modes in pH sensors include cracking, includingmicro-cracking, of membrane 16, electrolyte contamination, short circuitbetween electrodes, and poor insulation. Applicant discovered thatcertain characteristics of a measured impedance frequency responsespectrum can be used to analyze and identify different failure modes insensors. Accordingly, the method 100 was applied to pH sensors ofdifferent types having different defects embodied therein in severalexperiments described herein.

Experiment 1

Two sensor types (A: single junction pH sensor with liquid referenceelectrolyte; B: double junction pH sensor with wetted solid referenceelectrolyte) and totally six sensors were analyzed using the method 100.An initial pH test was conducted on each sensor in three buffersolutions, pH 4, 7 and 10 using the CM42 pH meter. The voltage outputresults (in mV) are contained in Table 1. The test data indicate thateach of the sensors was not working properly except B-3, which waswithin specification in all three buffer solutions.

TABLE 1 Initial pH Test Data mV reading in pH buffers impedance mVreading mV reading 4 7 10 (MΩ) pH-Ref (ext.) Ref-Ref (ext.) Sensor 177.5± 12 0 ± 12 −177.5 ± 12 in buffer 4 in buffer 4 in buffer 4 A-1 noreading  0  64 no reading A-2 no reading  0 163 no reading A-3 124 −45−216 525 176 45 B-1 107   11  −85 583 179 no reading B-2 128   24 −124444 175 no reading B-3 168  −6 −180 759 180 no reading

Sensors A-1 and A-2 both showed zero membrane impedance, no pH (in mV)reading in all pH buffers. Note: a feature of the CM42 pH meter is todisplay no pH or mV reading when membrane impedance is too low. SensorsA-1 and A-2 further exhibited no reading from the reference electrodeagainst an external reference electrode (i.e., Ref(ext.)). These resultssuggest that the sensors might have cracked pH glass bulbs, shortcircuits, or current leakage between the reference chamber and internalpH electrolyte through a cracked pH glass stem. The working electrode toexternal reference electrode output voltage (i.e., pH-Ref(ext)) readingof Sensor A-2 is slightly lower than specification, indicating themembrane is functioning but with some problem. The working electrode toexternal reference electrode output voltage reading of Sensor A-1 ismuch lower than specification but not zero. Such a result does notprovide a clear clue about the failure. Conventionally, physicaldissection and destruction of the sensor would to be the only way toidentify the root cause of the failure.

Applying the method 100, the measured impedance frequency responsespectra of Sensors A-1 and A-2 clearly exhibit very differentcharacteristics, as shown in FIGS. 6A and 6B. FIG. 6A shows a Nyquistplot of the response of Sensor A-1, showing two deformed semicircleswith a total impedance less than 1 MΩ. Applicant has found that such ameasured impedance frequency response spectrum is typical of a crackedmembrane, for example, cracked pH bulbs. FIG. 6B shows a Nyquist plot ofthe response of Sensor A-2, showing an inductive component (i.e.,negative imaginary impedance) and about zero total impedance. Applicanthas found that such a measured impedance frequency response is typicalof a short circuit, such as at the back seal or cable. A Sensor A-4 (notincluded in Table 1) containing an open circuit was evaluated using themethod 100. FIG. 6C shows a Nyquist plot of the response of Sensor A-4,showing a nearly vertical line indicating extremely large (e.g., greaterthan 1 GP total impedance with a positive imaginary part but nearly zeroreal part. Applicant has found that such a measured impedance frequencyresponse is typical of an open circuit. These reported failure modes andcorrelated impedance frequency response characteristics have beencorroborated and proven by physical dissection of Sensors A-1 and A-2and many other test sensors.

The data in Table 1 indicate that Sensors A-3, B-1 and B-2 had glassimpedance in normal range and a good pH-Ref(ext) reading, which suggestthat the cause of failure is very likely due to the malfunction of theirreference cells. Failure of the internal reference cell in these sensorswas further confirmed with a measurement of their impedance frequencyresponses between the internal reference electrode (Ref) and an externalreference electrode (Ref(ext)).

Among the key components of pH sensor reference cells, the referenceelectrolyte (i.e., the second electrolyte 32 for a single junction pHsensor; or the third electrolyte 34 for a double junction pH sensor) iscommonly a point of failure. To investigate the failure mode of SensorA-3 further, its reference electrolyte was replaced by drilling a holethrough the housing of Sensor A-3, flushing out the referenceelectrolyte with deionized water, and refilling the emptied volume withfresh reference electrolyte. Then, the Sensor A-3 was tested andexhibited normal performance. FIG. 7 shows the measured impedancefrequency response spectra before and after the replacement of thereference electrolyte. Thus, the differences of measured impedancefrequency response characteristics have been proven useful foridentifying reference cell failure modes as well.

For Sensors B-1 and B-2, since the reference electrolyte was solid,refilling the reference electrolyte was not possible. Therefore, furtherinformation was sought concerning the reference electrolyte using themethod 100. FIG. 8 shows the measured impedance frequency responsespectra for the Sensors B-1, B-2 and B-3 measured between the referenceelectrode 22 and an external reference electrode (i.e., Ref-Ref(ext)).The three resulting impedance spectra shown in FIG. 8 generally have asimilar shape, but the failed sensors (B-1 and B-2) have higherRef-Ref(ext) impedance than the good sensor (B-3), indicating possiblylower porosity, smaller pore size, clogging of the pores, or simplyhigher material density of the failed sensors' reference electrolyte,where no other defects are found with the reference cells. Thus, FIG. 8demonstrates that the method 100 may provide valuable guidance forfurther analysis and problem solving of such failure modes.

Experiment 2

The method 100 was further applied to characterize and analyze theeffects of steam sterilization on the glass membrane in a pH sensor,such as the sensor 10. Steam sterilizable (“SS”) pH sensors havingmembranes made with old SS glass and new SS glass were tested andcompared with two SS pH sensors made by other manufactures (i.e.,Sensors C1 and C2). The terms old SS glass and new SS glass simplyindicate two different types of glass membranes used in the sensorsunder test. One means of simulating the effects of the steamsterilization process on a pH sensor is to condition the sensor in asteam-in-place (“SIP”) test. The SIP test used in each experimentdisclosed herein included inserting at least the membrane of the pHsensor in a pipe conveying steam of above 100° C. for 30 minutes,cooling the sensor down to room temperature, then repeating the steamexposure and cooling processes for a total of three cycles. After theSIP test, the sensors were soaked in a 3 molar potassium chloride (KCl)solution for 60 hours.

Table 2 contains the pH test results and measured impedance frequencyresponse data using the method 100 for the pH sensor with old SS glassbefore and after the SIP test and after surface treatment. The surfacetreatment included etching and cleaning the glass membrane withhydrofluoric acid (i.e., HF). “Etching I” indicates that the outsidesurface of the glass membrane was treated for 5 minutes (mins) in 10% HFand cleaned with deionized water. “Etching II” indicates that the insidesurface of the glass membrane was treated for 5 minutes (mins) in 10% HFand cleaned with deionized water. The old SS glass sensor was evaluatedusing method 100 between each conditioning and treatment step. Theimpedance spectra data (C, R, Y_(o), and σ) in Table 2 were calculatedusing the simulation software with the equivalent circuit shown in FIG.4B.

TABLE 2 pH Test and Impedance Data of a Sensor Made with Old SS Glass mVreading in pH buffers response 4 7 10 time C R Y_(o) σ Condition 177.5 ±12 0 ± 12 −177.5 ± 12 (s) (pF) (MΩ) (S · s^(1/2)) (MΩ s^(−1/2)) new 170 −5 −177 15 370 460 5.80 × 10⁻⁸ 12 after SIP 162 −26 −199 50 371 4007.83 × 10⁻⁹ 90 after etching I 172    5 −175 34 465 327  1.8 × 10⁻⁸ 39

After the SIP test, the sensor was out of specification. Specifically,though the capacitance and resistance of the glass membrane werecomparable to that of the sensor before SIP exposure, the Warburgcoefficient (σ) representing diffusion resistance, increased from 12 to90 MW·s^(−1/2). After etching I, the voltage output of sensor in thethree standard pH buffer solutions was back to normal, although responsetime was still longer than a new sensor. Without being bound to aspecific theory, Applicant suggests that the etching surface treatmentcaused the glass membrane to become thinner and hence lower inresistance and higher in capacitance, while at the same time thediffusion resistance (i.e., the Warburg coefficient) also decreased to39 MW·s^(−1/2).

FIG. 9A shows the impedance spectra of the old SS glass sensor beforeand after SIP test and after etching I of the pH glass membrane. FIG. 9Bshows the impedance spectra of the old SS glass sensor after etching IIof the pH glass membrane. As shown in FIG. 9B, after etching II, thesensor functioned similar to new. Applicant suggests that the etching IItreatment caused the glass membrane to become even thinner and thusfurther lowered impedances. After the second surface treatment, theshape of the impedance spectrum was generally similar to that of a newsensor. Consequently, the method 100 indicates and quantifies how theSIP process changed the material of the glass membrane and how thematerial change very likely occurred only in a limited layer on theoutside and inside surfaces of the glass membrane.

Experiment 3

The method 100 was further applied to characterize and analyze theeffects of steam sterilization on the glass membrane in pH sensors, suchas the sensor 10, manufactured by other manufacturers. Steamsterilizable (“SS”) pH sensors having membranes made with new SS glassmanufactured by the Applicant (labeled “E+H”) were tested and comparedwith two SS pH sensors made by other manufactures (i.e., Sensors C1 andC2). The SIP test described with respect to Experiment 2 was used tocondition the sensor test samples in Experiment 3 as well.

Table 3 contains the pH test results and measured impedance frequencyresponse data using the method 100 for Applicant's pH sensor (i.e.,Sensor E+H) and for Sensors C1 and C2 before the SIP test. The impedancespectra data (C, R, Y_(o), and σ) in Table 3 were calculated using thesimulation software with the equivalent circuit shown in FIG. 4B. The σvalues were calculated using EQN. 5, and the C values were calculatedwith using EQN. 7. The highlighted mV datum is out of specification.

TABLE 3 pH Test and EIS Data of SS pH Sensors as New mV reading in pHbuffers |Z|_(total) pH 4 7 10 C R Y_(o) σ at 0.01 Hz Sensor 177.5 ± 12 0± 12 −177.5 ± 12 (pF) (MΩ) (S · s^(1/2)) (Ω · s^(−1/2)) (MΩ) C1 174   0−170  79 190 2.10 × 10⁻⁸ 34 336 C2 179   5 −164 317 434 7.52 × 10⁻⁸  9462 E + H 172 −3 −174 207 265 3.70 × 10⁻⁸ 19 341

Table 4 contains the pH test results and measured impedance frequencyresponse data using the method 100 for Applicant's pH sensor (i.e.,Sensor E+H) and for Sensors C1 and C2 after the SIP test. The impedancespectra data (C, R, Y_(o), and σ) in Table 4 were calculated using thesimulation software with the equivalent circuit shown in FIG. 9B. The σvalues were calculated using EQN. 5, and the C values were calculatedwith using EQN. 7. The highlighted mV data are out of specification.

TABLE 4 pH Test and EIS Data of the SS pH Sensors after SIP Test mVreading in pH buffers |Z|_(total) pH 4 7 10 C R Y_(o) σ at 0.01 HzSensor 177.5 ± 12 0 ± 12 −177.5 ± 12 (pF) (MΩ) (S · s^(1/2)) (Ω ·s^(−1/2)) (MΩ) C1 149 22 −193  66 160 1.14 × 10⁻⁸ 62 472 C2 164  9 −177294 356 1.59 × 10⁻⁸ 45 547 E + H 170  2 −177 200 280 7.20 × 10⁻⁸ 98 723

FIGS. 10A-10C show the time-based pH test results in voltage output(i.e., mV readings versus time) of the E+H, C1 and C2 sensors before andafter the SIP test. FIGS. 11A-11F show the Nyquist plots of the measuredimpedance frequency response spectra for the three sensors before andafter SIP test. The circular dots are measured data points; the squaresare fitted data points.

The pH test results of Tables 3 and 4 indicate: (1) the three SS pHsensors were all within specifications before SIP test, except thatSensor C2 was slightly lower than specification in pH 10 buffer; and (2)after the SIP test, Sensor C1 was completely out of specification,Sensor C2 was within specification in pH 7 and 10 buffers but slightlybelow specification in pH 4 buffer, and Sensor E+H was withinspecification in all three pH buffers. From FIGS. 10A-10C, Sensor E+Hhad a faster response than either Sensor C1 or C2.

The measured impedance frequency response spectra of FIGS. 11A-11F show:(1) the three sensors have no significant difference on total glassimpedance (either before or after SIP test), which is in the normalrange of pH sensors; (2) Sensor E+H exhibited lower resistance andcapacitance than Sensor C2, which at least partially explains SensorE+H's faster response because lower resistance and capacitance yields asmaller RC time constant and hence faster charge and dischargeprocesses; and (3) if the capacitance is too low, the glass membranedoes not have enough sensing capability for the H⁺ in a test solution,as in the case of Sensor C1 after the SIP test (capacitance, C, was only66 pF). Further, the point of balance between response time and sensingcapability seems to be somewhere between 66 pF and 79 pF for Sensor C1.

As demonstrated by the Experiments 1, 2 and 3, the method 100 providesan understanding the effects of a sensor's impedance components, bothindividually and interactively, on sensor performance, and the method100 enables a correlation between sensor impedance components and sensorperformance. Moreover, the method 100 was shown to be very useful forfailure mode analysis of sensors, particularly for identifying glassbulb cracks, short circuits, open circuit, and reference cell problemsin pH sensors. Further, the method 100 was shown to be useful forevaluating the effects of material type, operating conditions andsurface treatments on sensor performance. Therefore, the method 100 maybe applied to both quality control of manufactured sensors and rootcause failure mode analysis of sensors deployed in the field.

Accordingly, in at least one embodiment, the step 110 of the method 100may include identifying whether the total impedance is below a lowerthreshold or above an upper threshold and/or whether the imaginarycomponent of the total impedance is predominantly greater than or lessthan zero. Using the method 100, a sensor in which the total impedanceis below the lower threshold and the imaginary component ispredominantly greater than zero may be characterized as having a defectin a membrane of the sensor. A sensor in which the total impedance isbelow the lower threshold and the imaginary component is predominantlyless than zero may be characterized as having a short circuit. Further,a sensor in which the total impedance at the low frequency end is abovethe upper threshold and the real/imaginary component ratios arepredominantly less than a ratio threshold is characterized as having anopen circuit. In certain embodiments, determining whether thereal/imaginary component ratio is predominantly less than the ratiothreshold may include calculating the ratio threshold using real andimaginary components of the total impedance.

In certain embodiments of the method 100, the lower threshold may bearound 5 MΩ, and the upper threshold may be about 50 MΩ. In alternativeembodiments, the lower threshold may be around 10 MΩ, and the upperthreshold may be about 5 GΩ. In at least one embodiment, the lowerthreshold may be about 0.1 MΩ or about 10 kΩ. In certain embodiments ofthe method 100, the ratio threshold may be around 0.1. In certainembodiments, additionally or alternatively, the upper, lower and ratiothresholds may be ranges. The upper, lower and ratio threshold valuesdisclosed are merely exemplary values. In operation, specific upper,lower and ratio threshold ranges and values to be applied in the method100 for a given type of sensor are determined for the specific sensortype by characterizing a properly functioning sensor. Consequently, theappropriate upper, lower and ratio threshold values and/or ranges for agiven implementation of the method 100 may be different than theexemplary values disclosed herein.

In a further aspect of the present disclosure, the method 100 ofcharacterization and failure analysis of an electrochemical sensor(e.g., the sensor 10) may further be implemented on the ORP sensor 200.In a further aspect of the present disclosure, a method 300 ofcharacterization and failure analysis of an electrochemical sensor(e.g., the sensor 10 or the sensor 200) may include applying amulti-frequency signal to the sensor under test instead of scanning arange of frequencies, as in the method 100. For example, as shown inFIG. 13 , the method 300 may include a step 304 of applying a testsignal to the sensor 200 at a selected voltage between the referenceelectrode 222 and the ORP electrode 220 (e.g., the working electrode).In at least one embodiment, the test signal includes an alternatingcurrent having at least two frequencies in parallel.

The test signal may be, mathematically, the summation of two or morefrequencies of alternating current at the selected voltage. For example,as shown in FIG. 14 , a test signal 312 may include a first frequency314 of 1 Hz and a second frequency 316 of 4 Hz, which in parallel (e.g.,simultaneously) yield the test signal 312. In an embodiment, the firstfrequency may be less than 10 Hz and greater than 60 Hz. The test signal312 may include any suitable frequencies such as, for example,frequencies between 0.01 Hz and 300 kHz. In further embodiments, thetest signal 312 may include three different frequencies in parallel. Insuch an embodiment, the three frequencies may include 1 Hz, 4 Hz and 100Hz, for example. In an embodiment, the three different frequencies mayinclude a frequency less than 2 Hz, a frequency less than 10 Hz and afrequency greater than 60 Hz, for example.

The method 300 may include a step 306 of measuring an impedance of thesensor 200 between the reference electrode 222 and the ORP electrode 220over the at least two frequencies of the alternating current. The step306 may include measuring the impedance frequency response of the sensor200. The impedance may be measured by any suitable instrument, forexample, a potentiostat/galvanostat. In at least one embodiment of thepresent disclosure, equipment suitable to perform the measuring of theimpedance of the sensor 200 may be included in the sensor 200. Further,the sensor 200 may include equipment suitable to perform all or part ofthe method 300. For example, the sensor 200 may include hardware,software and firmware suitable to perform all or part of the method 300.In such an embodiment, the equipment may be integrated into a plug headof the sensor. In certain embodiments, the equipment may at leastpartially include the functionality of a potentiostat/galvanostat.

The step 306 may further include detecting a resulting signal at theworking electrode 220 and processing the resulting signal to determine afrequency response at each of the at least two frequencies of the testsignal. Such a step 306 may further include calculating the measuredimpedances from an amplitude and a phase angle for each of the at leasttwo frequencies of the resulting signal. The resulting signal is thesignal response of the working and reference electrode to the testsignal applied thereto. Applicant has discovered that the resultingsignal is nearly the same frequency response as would have been observedif the at least two frequencies had been applied sequentially, insteadof in parallel. This insight enables the method 300 to be performed morequickly and with less power consumption than a sequential method.

The method 300 may include a step 308 of analyzing the measuredimpedance to determine one or more total impedance of the sensor 200and/or the real and/or imaginary components of the one or more totalimpedance at and over the applied frequencies of the alternatingcurrent. In the step 308, the analysis may include generating a measuredimpedance frequency response spectrum. The analysis may further includedetermining a real/imaginary component ratio at various frequenciesbased the real and imaginary components of the total impedance at agiven frequency.

The method 300 may further include a step 310 of characterizing thesensor 200 based on the one or more total impedance of the sensor 200and/or on the real and/or imaginary components of the total impedance.In the step 310, the characterization may be qualitative and/orquantitative as discussed further herein. In certain embodiments, thestep 310 includes identifying the failure mode of an improperlyoperating sensor based on the total impedance of the sensor 200 and/oron the real and/or imaginary components of the total impedance. The step310 may further include determining the root cause of such failuremodes. In an exemplary implementation, the method 300 may be used as aquality control measure to qualify newly manufactured sensors beforethey are deployed in the field. In a further embodiment, thecharacterizing of the sensor 200 includes checking a status of thesensor 220.

In at least one embodiment of the present disclosure, the method 300 maybe applied to a combination pH-ORP sensor. Such sensors enable ORPmeasured values to be compensated for changes in pH. In at least oneembodiment, as shown in FIG. 15 , a pH-ORP sensor 250 may include an ORPelectrode 258, a pH electrode 254, which include an ion-sensitivemembrane 255 (e.g., a glass membrane), and a reference electrode 252,which includes a reference junction 253. The reference junction 253 maybe any suitable junction such as, by way of non-limiting example, aliquid junction, a ceramic diaphragm, a platinum junction, an annulargap, a ground joint or fiber junction. The ORP electrode 258 includes anORP measuring element 259, which may include an inert metal such as, forexample, platinum. In embodiments applied to such combination pH-ORPsensors, the pH electrode 254 or the ORP electrode 258 may bealternately treated as the working electrode of the method 300, asdescribed further herein.

The pH-ORP sensor 250 may include measuring electronics 260 having amicrocontroller 262, for example. The measuring electronics 260 may beincluded in the sensor 250, for example, in a plug head of the sensor250. Alternatively, only certain portions of the measuring electronics260, or none at all, may be included in the sensor 250. In anembodiment, the microcontroller 262 may include a digital-to-analogconverter (DAC) 264 and an analog-to-digital converter (ADC) 266. Inalternative embodiments, the measuring electronics 260 are separatefrom, but connectable to, the pH-ORP sensor 250. The measuringelectronics 260 may further include at least one processor programmableand operable to execute the operations of the methods of the presentdisclosure.

In at least one exemplary embodiment of the method 300, a test signal267 may be applied to the reference electrode 252 relative to areference via the DAC 264. A resulting signal 269 from the ORP electrode258 relative to a reference may be detected and processed via the ADC266 and the microcontroller 262. Further, a resulting signal 268 fromthe pH electrode relative to a reference may be detected and processedvia the ADC 266 and the microcontroller 262. The resulting signals 268,269 may be processed according to the method 300 to determine a failuremode of the sensor 250.

Further, referring to FIGS. 12 and 13 , the method 300 may be employedto detect and characterize defects in the sensor 200 as described hereinwith respect to the sensor 10 and the method 100. For example, using themethod 300, a short circuit between the reference electrode 222 and theORP electrode 220 may be detected and characterized. In such anembodiment, the lower threshold may be about 100Ω or, in certainembodiments, about 10Ω.

In an embodiment, using the method 300, an open circuit (e.g., contactinterruption) between the ORP electrode 220 and the reference electrode222 or the reference junction 253 may be detected and characterized. Forexample, in such an embodiment, an open circuit condition between thereference electrode 222 and the ORP electrode 220 may be detected andcharacterized where the upper threshold is about 5 GΩ or, in certainembodiments, about 10 GΩ.

In a further embodiment, using the method 300, a blockage or partiallyblockage of the ORP measuring element 259 or the reference junction 253may be detected and characterized. For example, such blocking mayinclude contamination that inhibits, attenuates, decreases or preventselectrochemical contact between an electrode and the medium to bemeasured. Applicant has discovered that the impedance increases withincreasing blockage of the ORP measuring element 259 or the referencejunction 253. In an embodiment of the present disclosure, the measuringelectronics 260 may issue an alarm or an alert when the total impedanceat the low frequency end exceeds a warning threshold. In such anembodiment, the warning threshold may be about 50 kΩ. In a furtherembodiment, the warning threshold may be about 100 kΩ. The warningthreshold may be defined to be an impedance value that is sufficientlygreater than a properly functioning sensor.

The method 300 may be employed to characterize short circuit conditionsin ORP sensors having integrated temperature sensors as described hereinwith respect to the temperature sensor 24 of the sensor 10. The method300 may further be employed for characterization and failure analysis ofthe pH sensor 10. In such an embodiment, the test signal 267 may beapplied to the reference electrode 22, and the resulting signal 268 fromthe working electrode 20 may be detected and processed relative to thereference. The resulting signal 268 may be processed according to themethod 300 to determine a failure mode of the sensor 10 as describedherein with respect to the sensor 250.

While various embodiments of a method for characterizing and analyzing asensor have been described in considerable detail herein, theembodiments are merely offered by way of non-limiting examples of thedisclosure described herein. It will therefore be understood thatvarious changes and modifications may be made, and equivalents may besubstituted for elements and steps thereof, without departing from thescope of the disclosure. Indeed, this disclosure is not intended to beexhaustive or to limit the scope of the disclosure.

Further, in describing representative embodiments, the disclosure mayhave presented a method and/or process as a particular sequence ofsteps. However, to the extent that the method or process does not relyon the particular order of steps set forth herein, the method or processshould not be limited to the particular sequence of steps described.Other sequences of steps may be possible. Such sequences may be variedand still remain within the scope of the present disclosure. Therefore,the particular order of the steps disclosed herein should not beconstrued as limitations of the present disclosure.

The invention claimed is:
 1. A method of characterization and failureanalysis of a measuring sensor, the method comprising: applying a testsignal to a sensor, the test signal comprising an alternating currenthaving at least two frequencies, each at a selected voltage, whereineach selected voltage is applied between a reference electrode and aworking electrode of the sensor, and wherein the test signal comprisesthe at least two frequencies in parallel; measuring an impedance of thesensor between the reference electrode and the working electrode overthe at least two frequencies of the alternating current; analyzing themeasured impedances to determine one or more total impedance of thesensor and/or the real and/or imaginary components of the one or moretotal impedance at the at least two frequencies of the alternatingcurrent; and characterizing the sensor based on the one or more totalimpedance and/or on the real and/or imaginary components of the one ormore total impedance, wherein the characterizing includes identifyingwhether the total impedance at a low frequency end is below a lowerthreshold or above an upper threshold and/or whether imaginarycomponents at various frequencies are predominantly greater than or lessthan zero, wherein a sensor in which the total impedance at the lowfrequency end is above the upper threshold and the real/imaginarycomponent ratio at various frequencies are predominantly less than aratio threshold is characterized as having an open circuit, and/orwherein a sensor in which the total impedance at the low frequency endis below the lower threshold and the imaginary components at variousfrequencies are predominantly less than zero is characterized as havinga short circuit.
 2. The method of claim 1, wherein the measuring of theimpedance includes: detecting a resulting signal at the workingelectrode relative to a reference; processing the resulting signal todetermine a frequency response at each of the at least two frequenciesof the test signal; and calculating the measured impedances from anamplitude and a phase angle for each of the at least two frequencies ofthe resulting signal.
 3. The method of claim 1, wherein the test signalincludes two different frequencies in parallel.
 4. The method of claim3, wherein the two different frequencies include a frequency less than10 Hz and a frequency greater than 60 Hz.
 5. The method of claim 1,wherein the test signal includes three different frequencies inparallel.
 6. The method of claim 5, wherein the three differentfrequencies include a frequency less than 2 Hz, a frequency less than 10Hz and a frequency greater than 60 Hz.
 7. The method of claim 1, whereinthe lower threshold is around 100 ohms (Ω) or 10 Ω.
 8. The method ofclaim 1, wherein the upper threshold is about 5 gigaohms (GΩ) or 10 GΩ.9. The method of claim 1, wherein the upper threshold is about 5 GΩ andthe ratio threshold is around 0.1.
 10. The method of claim 1, whereinthe characterizing includes determining whether a junction of thereference electrode or a measuring element of the working electrode isblocked.
 11. The method of claim 10, wherein an alarm is issuedindicating a blockage of the junction or the measuring element when theone or more total impedance exceeds a warning threshold, the warningthreshold being about 50 kiloohms.
 12. The method of claim 1, whereinthe sensor is a pH sensor, an oxidation-reduction potential sensor or acombination pH-ORP sensor.
 13. The method of claim 1, wherein thereference electrode is an external reference electrode connected to orassociated with the sensor.
 14. The method of claim 1, wherein thesensor is characterized as a step in a quality control process.
 15. Themethod of claim 1, wherein the characterizing includes determining afailure mode of the sensor.
 16. The method of claim 1, whereincharacterizing of the sensor includes checking a status of the sensor.17. The method of claim 1, wherein the sensor includes equipmentsuitable to perform the measuring of the impedance of the sensor atvarious frequencies.